四氟化硅

• 产品号: 463019
• CAS号: 7783-61-1
• 分子式: F4Si
• 分子量: 104.0791128
• 纯 度: ≥99.99%

产品别名

• 标题: Silicon tetrafluoride
• IUPAC标准名: tetrafluorosilane
• IUPAC传统名: silicon tetrafluoride
• 别名: Silicon(IV) fluoride; 氟化硅(IV)

产品登记号

• MDL号: MFCD00040533
• CAS号: 7783-61-1
• PubChem SID: 24869885
• EC号: 232-015-5

产品性质

• 级别: electronic grade
• 杂质: <0.5 ppm Carbon monoxide (CO)
• 杂质: <1 ppm Argon + oxygen (Ar + O2)
• 杂质: <1 ppm Carbon dioxide (CO2)
• 杂质: <10 ppm Methane (CH4)
• 杂质: <3 ppm Nitrogen (N2)
• 杂质: <50 ppm Hydrogen fluoride (HF)
• 线性分子式: SiF4
• 纯度: ≥99.99%
• 沸点: -86 °C(lit.)
• 密度: 3.57 g/mL at 25 °C(lit.)
• 熔点: -90 °C(lit.)
• 转变温度: critical temperature -14.2 °C
• GHS警示词: Danger
• GHS危险声明: H300 +H310 + H330-H314
• 欧盟危险性物质标志: 剧毒(Highly toxic) (T+)
• 个人保护装置: Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US)
• GHS警示性声明: P260-P264-P280-P284-P301 + P310-P302 + P350
• RID/ADR: UN 1859 2.3
• 危险公开号: 14-26/27/28-31-34
• RTECS编号: VW2327000
• 安全公开号: 23-26-36/37/39-45
• 欧盟补充危害声明: Contact with water liberates toxic gas., Reacts violently with water.
• 联合国危险货物等级: 2.3
• 联合国危险货物编号: 1859
• 德国WGK号: 3

产品详细信息

详细说明 (English)

Application
Silicon tetrafluoride is used in ion-implantation processes and as a precursor to fluorinated silica via plasma-assisted CVD. Mixtures of SiF4-SiH4-H2 have recently been used to deposit polycrystalline silicon thin films via remote plasma chemical vapor deposition (RPCVD).1,2 Such fluorinated thin films show visible photoluminescence (PL) at room temperature.3
Packaging
100 g in steel cylinder
Recommended products
Monel control valves Z261793, Z261807 or Monel gas regulators Z405981, Z406007 are recommended.

详细说明 (简体中文)

Application
四氟化硅用于离子注入过程，在等离子辅助化学气相沉积中作为氟化二氧化硅的前体。SiF4-SiH4-H2 混合物用于远距等离子辅助化学气相沉积法 (RPCVD) 沉积多晶硅薄膜。1,2这种氟化薄膜在室温下具有可见光致发光 (PL) 特性。3
包装
100 g in steel cylinder
Recommended products
推荐使用 Monel 控制阀 Z261793、Z261807 或 Monel 气体调节器 Z405981、Z406007。