钇酸锆基片, 10x10x0.5mm,一面抛光, 100 orientation
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钇酸锆基片, 10x10x1mm,一面抛光, 100 orientation
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氧化锆/氧化钇靶, 50.8mm (2.0in) 直径 x 3.18mm (0.13in) 厚
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氧化锆/氧化钇靶, 76.2mm (3.0in) 直径 x 3.18mm (0.13in) 厚
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氧化锆/氧化钇靶, 76.2mm (3.0in) 直径 x 6.35mm (0.25in) 厚
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氧化锆/氧化钇靶, 50.8mm (2.0in) 直径 x 6.35mm (0.25in) 厚
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氧化锆氧化钇基片, 10x10x0.5mm, 两面抛光, 100 orientation
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氧化锆氧化钇基片, 10x10x1mm, 两面抛光, 100 orientation
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Zirconium oxide Yttrium oxide substrate, 10x10x0.5mm, polished one side, 100 orientation
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Zirconium oxide Yttrium oxide substrate, 10x10x1mm, polished one side, 100 orientation
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Zirconium oxide/Yttrium oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.13in) thick
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Zirconium oxide/Yttrium oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.13in) thick
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Zirconium oxide/Yttrium oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.25in) thick
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Zirconium oxide/Yttrium oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.25in) thick
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Zirconium oxide Yttrium oxide substrate, 10x10x0.5mm, polished 2 sides, 100 orientation
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Zirconium oxide Yttrium oxide substrate, 10x10x1mm, polished 2 sides, 100 orientation
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