tetrabutylazanium fluoride hydrofluoride

• ChemBase编号: 152203
• 分子式: C16H37F2N
• 平均质量: 281.4684864
• 单一同位素质量: 281.28940663
• SMILES: CCCC[N+](CCCC)(CCCC)CCCC.F.[F-]
• Canonical SMILES: CCCC[N+](CCCC)(CCCC)CCCC.F.[F-]
• InChI: InChI=1S/C16H36N.2FH/c1-5-9-13-17(14-10-6-2,15-11-7-3)16-12-8-4;;/h5-16H2,1-4H3;2*1H/q+1;;/p-1
• InChIKey: ZHBDKVWQJKYIFF-UHFFFAOYSA-M

名称和登记号

名称

• IUPAC标准名: tetrabutylazanium fluoride hydrofluoride
• IUPAC传统名: tetrabutylammonium fluoride hydrofluoride
• 别名: 四丁基二氟化铵; 四正丁基二氟化铵氢氟酸盐 溶液; TBABF; Tetrabutylammonium difluoride; Tetrabutylammonium bifluoride; Tetrabutylammonium hydrogen difluoride solution

登记号

• CAS号: 23868-34-0
• MDL号: MFCD00077877
• Beilstein号: 4729304
• PubChem SID: 162246348; 24888785; 24887099
• PubChem CID: 10891295

理论计算性质

• 质子受体: 0
• 质子供体: 0
• LogD (pH = 5.5): 1.3234289
• LogD (pH = 7.4): 1.3234289
• Log P: 1.3234289
• 摩尔折射率: 91.3961 cm^3
• 极化性: 31.734425 Å^3
• 极化表面积: 0.0 Å^2
• 可自由旋转的化学键: 12
• 里宾斯基五规则: true

分子性质

理化性质

• 闪点: <10 °C; <50 °F
• 折射率: n20/D 1.442

安全信息

• 欧盟危险性物质标志: 腐蚀性(Corrosive) (C); 易燃性(Flammable) (F)
• 联合国危险货物编号: 2922; 2924
• 德国WGK号: 3
• 联合国危险货物等级: 3; 8
• 联合国危险货物包装类别(PG): 2
• 危险公开号: 11-20/21/22-34; 34-40
• 安全公开号: 16-26-36/37/39-45; 26-36/37/39-45
• GHS危险品标识: GHS02; GHS05; GHS07; GHS08
• GHS警示词: Danger
• GHS危险声明: H225-H302-H314; H314-H351
• GHS警示性声明: P210-P280-P305 + P351 + P338-P310; P280-P305 + P351 + P338-P310
• 个人保护装置: Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter
• RID/ADR: UN 2922 8/PG 2; UN 2924 3/PG 2
• 保存温度: 2-8°C

产品相关信息

• 浓度: ~50% in acetonitrile; ~50% in methylene chloride (T)
• 级别: technical
• 杂质: ~5% tetrabutylammonium chloride; ≤1% water
• 线性分子式: (CH3CH2CH2CH2)4N(HF2)

详细说明

Sigma Aldrich - 77004

Other Notes
有效的氟化剂5,6
包装
100 mL in poly bottle
Application

• Used as an etchant for silica films1Reactant for:
• Nucleophilic fluorination2
• Ring-opening fluorination reaction3
• Substitution reactions4

Sigma Aldrich - 86856

Application

• Used as an etchant for silica films1Reactant for:
• Nucleophilic fluorination2
• Ring-opening fluorination reaction3
• Substitution reactions4