别名
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氧化镁, Puratronic®
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氧化镁, ACS
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氧化镁衬底, 10x10x0.5mm,一面抛光, 100 orientation
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氧化镁基片, 10x10x1mm,一面抛光, 100 orientation
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氧化镁
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氧化镁基片, 10x10x1mm, 单面抛光, 110 orientation
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氧化镁基片, 10x10x0.5mm, 一面抛光, 111 orientation
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氧化镁基片, 10x10x0.5mm, 一面抛光, 110 orientation
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氧化镁基片, 10x10x1mm, 一面抛光, 110 orientation
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氧化镁溅射靶, 50.8mm (2.0in) 直径 x 6.35mm (0.250in) 厚
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氧化镁溅射靶, 76.2mm (3.0in) 直径 x 6.35mm (0.250in) 厚
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氧化镁基片, 10x10x0.5mm,两面抛光, 100 orientation
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氧化镁溅射靶, 50.8mm (2.0in) 直径 x 3.18mm (0.125in) 厚
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氧化镁溅射靶, 76.2mm (3.0in) 直径 x 3.18mm (0.125in) 厚
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Magnesium oxide, Puratronic®
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Magnesium oxide, ACS
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Magnesium oxide substrate, 10x10x0.5mm, polished one side, 100 orientation
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Magnesium oxide substrate, 10x10x1mm, polished one side, 100 orientation
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Magnesium oxide
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Magnesia
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Magnesium oxide substrate, 10x10x1mm, polished two sides, 100 orientation
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Magnesium oxide substrate, 10x10x0.5mm, polished one side, 111 orientation
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Magnesium oxide substrate, 10x10x0.5mm, polished one side, 110 orientation
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Magnesium oxide substrate, 10x10x1mm, polished one side, 110 orientation
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Magnesium oxide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick
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Magnesium oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick
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Magnesium oxide substrate, 10x10x0.5mm, polished two sides, 100 orientation
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Magnesium oxide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick
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Magnesium oxide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick
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Calcined brucite
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MAGNESIUM OXIDE ACS REAGENT GRADE
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